A simulated annealing algorithm based on a closed loop layout for facility layout design in flexible manufacturing systems

A simulated annealing algorithm based on a closed loop layout for facility layout design in flexible manufacturing systems

0.00 Avg rating0 Votes
Article ID: iaor2007626
Country: United Kingdom
Volume: 44
Issue: 13
Start Page Number: 2561
End Page Number: 2572
Publication Date: Jan 2006
Journal: International Journal of Production Research
Authors: ,
Keywords: facilities, optimization: simulated annealing
Abstract:

Facility layout design problems in flexible manufacturing systems (FMS) differ from traditional facility design problems and are more difficult to solve because there are more constraints that must be considered (i.e., cell shape, cell orientation, pick-up and drop-off point positions). The focus of this paper is on the closed loop type layout, which is based on a predetermined layout pattern. This layout pattern is commonly found in manufacturing settings since it requires a simplified material handling system configuration and since it facilitates a modular and expandable layout structure. The open-field type layout problem, where there is no predetermined layout pattern, may potentially have a more efficient configuration, since there are fewer restrictions. However, this problem is more difficult to solve and may result in configurations that are not desirable due to the lack of structure or modularity. The procedure developed in this paper improves the efficiency of the closed loop configuration by changing the rectangular shape of the loop to different sizes. In many cases, the resulting closed loop layout proves to be as efficient as the open field layout. A simulated annealing procedure (SA-CL) is used to search for the configuration that minimizes the total material handling costs. A comparison of the results with existing methods indicates that, based on solution quality and computational time, the SA-CL offers a favourable alternative for efficient layout design.

Reviews

Required fields are marked *. Your email address will not be published.