Article ID: | iaor20042984 |
Country: | United Kingdom |
Volume: | 9 |
Issue: | 4 |
Start Page Number: | 260 |
End Page Number: | 264 |
Publication Date: | Jul 1996 |
Journal: | International Journal of Computer Integrated Manufacturing |
Authors: | Sirinaovakul Booncharoen |
Keywords: | layout |
This paper presents a new approach for classifying facility layout techniques. Classification is based on the analysis of facility layout process as layout improvement, entire layout and partial layout model. This classification contributes two important concepts. First, it gives an idea of how the facility layout algorithm can be constructed; and second, it provides an idea of how the quality of the facility layout algorithm can be improved. Previous research into facility layout algorithms is also analysed to support the classification concept.