Systematic layout planning; A study on semiconductor wafer fabrication facilities

This paper proposes to use Muther's systematic layout planning procedure as the infrastructure to solve a fabrication layout design problem. A multiple objective decision-making tool, analytic hierarchy process, is then proposed to evaluate the design alternatives. The proposed procedure is illustrated to be a viable approach for solving a fabrication layout design problem through a real-world case study. It features both the simplicity of the design process and the objectivity of the multiple-criteria evaluation process as opposed to existing solution methodologies.