Vehicle dispatching for highly loaded semiconductor production considering bottleneck machines first

Vehicle dispatching for highly loaded semiconductor production considering bottleneck machines first

0.00 Avg rating0 Votes
Article ID: iaor2007279
Country: United States
Volume: 17
Issue: 1
Start Page Number: 23
End Page Number: 38
Publication Date: Jan 2005
Journal: International Journal of Flexible Manufacturing Systems
Authors: , ,
Keywords: production, simulation: applications, vehicle routing & scheduling
Abstract:

Semiconductor wafer fabrication lines can be characterized by re-entrant product flow, long production lead-time, large variety of production processes, and large capital investment. These distinctive characteristics make the flow control in the fab very complicated. Throughput rate and lead-time are among the most important performance measures. The throughput rate is usually determined by a bottleneck resource, and the lead-time depends on the machine utilization level and the amount of variability in the system. Due to the high efficiency of material handling and reduced particles, automated material handling systems such as automatic guided vehicles, overhead hoist transporters, and overhead shuttles are being widely used in wafer fabrication lines (wafer fabs) instead of human operators. Although a material handling system itself is seldom a bottleneck of production in a fab, it is important for that to effectively support the bottleneck machines to maximize the throughput and reduce production lead-time. This paper presents a vehicle dispatching procedure based on the concept of theory of constraints, in which vehicle dispatching decisions are made to utilize the bottleneck machines at the maximum level. Simulation experiments have been performed to compare the proposed vehicle dispatching procedure with existing ones under different levels of machine utilization, vehicle utilization, and local buffer capacity.

Reviews

Required fields are marked *. Your email address will not be published.