| Article ID: | iaor1989417 |
| Country: | United States |
| Volume: | 19 |
| Issue: | 5 |
| Start Page Number: | 49 |
| End Page Number: | 56 |
| Publication Date: | Sep 1989 |
| Journal: | Interfaces |
| Authors: | Schmidt Michael S., Meile Larry L. |
| Keywords: | statistics: general, engineering |
Shipley Company supplies photoresist to the microelectronics industry for use in chip making. A design team developed a new photoresist using Taguchi experimental deisgns to describe the linear responses of key characteristics and linear programming to optimize the factors of formulation. The authors interchanged objective statements and property constraints when key properties were identified. This method of development allowed the design team to take the new photoresist, Megaposit S9400, from concept to market place in just seven months.